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在使用SiNx压力工程技术的GaN基HEMT中提高直流性能和射频特性
Chenkai Deng1,2, Peiran Wang2, Chuying Tang1,2
1School of Energy Science and Engineering, Harbin Institute of Technology, Harbin 150001, China.
Nanomaterials (Basel, Switzerland)
|September 27, 2024
概括
压缩SiNx被动化显著增强化 (GaN) 高电子移动性晶体管 (HEMT). 这种技术减少了门泄漏,增加了故障电压,并改善了先进通信系统的高频性能.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 基于化 (GaN) 的高电子移动性晶体管 (HEMT) 对高频和高功率应用至关重要.
- 优化设备性能需要解决诸如门泄漏和故障电压等挑战.
研究的目的:
- 研究SiNx应力工程技术对GaN HEMT直流和射频特征的影响.
- 评估压缩SiNx被动化在提高设备性能和可靠性的有效性.
主要方法:
- 系统地调查GaN HEMT的直流性能和射频特性.
- 应用SiNx应力工程技术,特别是压力应力被动化.
- 分析电场分布,屏障厚度和道抑制.
主要成果:
- 压缩SiNx被动化减少了电场峰值,增加了有效屏障厚度,抑制了福勒-诺德海姆 (FN) 道.
- 门的泄漏率下降了超过一个数量级,故障电压 (BV) 从44V增加到84V.
- 峰值传导率提高到366 mS/mm,切断频率 (ft) 和最大振荡频率 (fmax) 分别达到21.15 GHz和35.66 GHz.
结论:
- SiNx压力工程技术,特别是压力压力,显著提高了GaN HEMT的性能.
- 改进的门控制,减少泄漏,以及更高的故障电压导致了优越的功率性能.
- 这种技术显示出下一代高频和高输出功率通信系统的巨大潜力.
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