碳铁颗粒的增强涂层效果提高了磁铁流体的分散稳定性
Fang Chen1, Jie Zhang1, Qinkui Guo1
1Key Laboratory of Fluid and Power Machinery, Ministry of Education, Xihua University, Chengdu 610039, China.
Materials (Basel, Switzerland)
|September 28, 2024
概括
盐酸蚀刻增强了碳铁颗粒上的1,2-bis(triethoxysilyl) 乙涂层,提高了磁石流体的稳定性和性能. 这种方法提供了优越的剪切应力和减少沉积.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 类风病学 类风病学 类风病学
背景情况:
- 磁铁流体 (MRF) 在各种应用中至关重要.
- 提高MRF的分散稳定性和性能是一个持续的挑战.
- 碳铁颗粒 (CIP) 的表面修饰是提高MRF性能的关键.
研究的目的:
- 为了增强1,2-bis(triethoxysilyl) 乙 (BTES) 在碳铁颗粒 (CIP) 上的涂层效果,使用盐酸 (HCl) 蚀刻.
- 为了提高MRF的分散稳定性和质性质.
- 为了研究HCl度,粒子表面变化和MRF性能之间的关系.
主要方法:
- 蚀刻CIP具有不同度的HCl.
- 用BTES涂层蚀刻的CIP.
- 使用SEM,BTE,FTIR,TGA和VSM对修改后的CIP进行表征.
- 评估MRF属性使用旋转流体计和形塔.
主要成果:
- HCl蚀刻在CIP上产生并去除了纳米孔,改变了特定的表面积.
- 最佳的HCl度 (0.50mol/L) 导致纳米孔结构和表面积的急剧变化.
- BTES涂层质量显著增加,而颗粒和磁化却下降.
- 增加的BTES涂层在没有磁场的情况下增加了粘度和剪切应力,但在磁场下降了它们.
- MRF沉积率从0.13降低到0.01mm/h,表明分散稳定性得到改善.
结论:
- 控制的HCl蚀刻有效地增强了CIP上的BTES涂层.
- 优化的涂层显著改善了MRF的剪切应力和分散稳定性.
- 这种方法对基础研究和实际MRF应用都有希望.
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