在范德瓦尔斯2D晶体管中使用随机电报信号来描述六角化内部的缺陷
Zhujun Huang1, Ryong-Gyu Lee2, Edoardo Cuniberto1
1Electrical and Computer Engineering, New York University, Brooklyn, New York 11201, United States.
ACS nano
|September 28, 2024
概括
鉴定单晶六角化 (hBN) 的缺陷对于先进的电子技术至关重要. 低频噪声光谱识别了hBN中的替代碳缺陷,使缺陷工程能够提高设备性能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术 纳米技术
背景情况:
- 单晶六角化 (hBN) 对二维电子和量子设备至关重要.
- 在hBN中的缺陷显著影响设备性能,需要表征和工程.
研究的目的:
- 通过低频噪声 (LFN) 谱学研究hBN中的缺陷捕获和发射动态.
- 在异构结构中识别hBN缺陷的原子起源.
主要方法:
- 在 hBN 封装的 MoS2 场效应晶体管 (FET) 上利用了 LFN 光谱学.
- 分析了取决于门偏差和温度的LFN数据,以检测随机电报信号 (RTS).
- 在一个有缺陷的hBN/MoS2异构模型上进行了多空间密度函数理论 (MS-DFT) 计算.
主要成果:
- 在冷温度下在大面积 (100μm2) 设备内的hBN中检测到来自单个陷物种的RTS.
- 在位上确定了替代碳原子作为RTS的原子起源.
- 证明了LFN光谱在表征hBN缺陷方面的有效性.
结论:
- 在hBN中的替代碳缺陷被确定为MoS2 FET中的噪声来源.
- 与MS-DFT分析相结合的LFN光谱是hBN中原子级缺陷表征的强大工具.
- 这种方法促进了缺陷工程,以提高二维设备的性能.
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