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Updated: Jun 11, 2025

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Published on: March 20, 2019

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双甲聚氧乙烯乙硫酸作为铜电子沉积的新等级器

Qing Cheng1, Ning Li1, Bo Wu1

  • 1School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin 150001, P.R. China.

Langmuir : the ACS journal of surfaces and colloids
|October 7, 2024
PubMed
概括

双A聚氧乙烯硫酸 (BPA) 添加剂,特别是BPA-25,有效抑制铜沉积. 这项研究详细介绍了使用电沉积制造纳米结合铜 (nt-Cu) 薄膜的制造,为nt-Cu生长机制提供了新的见解.

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