通过使用二维半金属Cr2Se3设计高性能纳米级Spin-MOSFET设备
Shao-Xian Wang1, Ya-Qi Kong1, Sheng-Yi Zhang1
1Shandong Key Laboratory of Medical Physics and Image Processing & Shandong Provincial Engineering and Technical Center of Light Manipulations, School of Physics and Electronics, Shandong Normal University, Jinan 250358, China.
ACS applied materials & interfaces
|October 7, 2024
概括
这项研究设计了使用半金属2D Cr2Se3电极和各种2D半导体的高性能纳米级自旋MOSFET设备. 这些设备几乎具有100%的自旋偏振和巨大的磁阻,为先进的自旋电子学铺平了道路.
科学领域:
- 螺旋电子和纳米尺度设备
- 材料科学是关于二维材料的科学.
- 计算凝聚物质物理学 物理
背景情况:
- 纳米级旋转设备的开发对于推进纳米旋转电子技术至关重要.
- 半金属二维 (2D) 材料为高性能旋转电子提供了潜力.
- 设计电极和通道材料之间的高效接口是设备功能的关键.
研究的目的:
- 从理论上设计高性能纳米级自旋MOSFET设备,使用半金属2D Cr2Se3作为电极.
- 为了研究2D Cr2Se3与各种2D半导体通道材料之间的接触特性.
- 评估设计的旋转MOSFET的旋转传输特性和门调制能力.
主要方法:
- 使用密度函数理论 (DFT) 和非平衡格林函数 (NEGF) 方法进行理论设计和分析.
- 研究的接口特性,包括接触类型 (欧米克与肖特基) 和半金属特征的保存.
- 模拟旋转极化电流,旋转注射效率 (SIE),磁阻 (MR) 和旋转MOSFET设备的下值摆动 (SS).
主要成果:
- 确定了几个2D半导体 (Sb,MoTe2,WTe2,WSeTe),与Cr2Se3形成垂直欧米接触,保留了半金属特性.
- 设计的旋转MOSFET设备显示了近100%的SIE和巨大的磁电阻 (> 10^7%) 与门电压变化.
- 实现了自旋极化电流的高效门调制,Cr2Se3/WTe2装置显示最小的SS为134.1mV/dec.
结论:
- 2D Cr2Se3 是构建高性能纳米级旋转MOSFET设备的有希望的候选材料.
- 选择2D通道材料显著影响接触特性和设备性能.
- 这项研究提供了关于使用二维半金属电极设计先进的自旋电子设备的见解.
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