基于异质连接带隙工程的Schottky屏障内存,用于高密度和低功率的保留
Hyangwoo Kim1, Yijoon Kim2, Kyounghwan Oh3
1Future IT Innovation Laboratory, Pohang University of Science and Technology (POSTECH), Pohang, 37673, South Korea.
Discover nano
|October 7, 2024
概括
一个新的Schottky屏障存储器 (SBRAM) 提供了一个无电容设计,用于可靠的高密度存储. 这种新的方法克服了传统的动态随机存储器 (DRAM) 和基于的替代品的局限性.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 传统的动态随机存储器 (DRAM) 由于容量不足而面临可靠性挑战.
- 现有的电容增强技术增加了制造成本和复杂性.
- 基于的无电容内存表现出显著的可靠性和功耗问题.
研究的目的:
- 引入一种新的Schottky屏障内存 (SBRAM),消除了复杂电容结构的需要.
- 为了利用带隙工程和异质连接来提高内存性能.
- 为了实现高密度集成,使用垂直交点数组.
主要方法:
- 实施了舒特基连接,以最大限度地减少反向泄漏电流.
- 使用异质连接来创建不同的存储区域.
- 将内存配置为垂直交点数组,用于4F2的足迹.
主要成果:
- 斯科特基交叉口有效地抑制了偷偷的电流路径,减少了读出错误.
- 异质连接使得有三个不同的电阻状态,具有逐渐的电流斜率,以获得足够的持有率.
- 编程状态可以维持在1.1V,电流非常低,为35.7fA,无需进行刷新操作.
结论:
- SBRAM提供了一个可行的,高密度和可靠的内存解决方案.
- 拟议的设计克服了传统DRAM和现有的无电容技术的局限性.
- 带隙工程的异质连接是实现强大和高效内存的关键.
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