一个hBN/Ga2O3 pn连接二极管
Shambel Abate Marye1, Xin-Ying Tsai2, Ravi Ranjan Kumar1
1International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu, 30010, Taiwan, ROC.
Scientific reports
|October 8, 2024
概括
这项研究开发了一种新的伪垂直PNN异构连接,使用六角化 (hBN) 和氧化 (Ga2O3). 该设备表现出高整形比率和稳定的性能,为先进的功率电子铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
背景情况:
- 六角性化 (hBN) 和氧化 (Ga2O3) 是深紫外 (DUV) 辐射和功率电子的关键下一代材料.
- 开发高效的异质连接对于实现它们的全部潜力至关重要.
研究的目的:
- 制造和描述一个伪垂直的PN异质连接装置,将p型hBN和n型Ga2O3.3结合在一起.
- 评估设备的电气性能,包括整正比,电流-电压特性和稳定性.
主要方法:
- 伪垂直PNHBN/Ga2O3异质连接的制造.
- 使用电流-电压 (I-V) 和电容-电压 (C-V) 测量进行电气表征.
- 霍尔效应测量以确认hBN的p型特征.
主要成果:
- 实现了高整形比率>10^5在300K和~400在475K.
- 在高达475K的温度坡上证明了稳定和可重复的设备性能.
- 确认了p型导电性在Mg-doped hBN中,内置电压为2.34V.
结论:
- 制造的hBN/Ga2O3异质连接表现出极好的整形性和热稳定性.
- 这种设备对高性能电力电子应用有很大的希望.
- 进一步的研究将探索这种异质连接系统的光学发射特性.
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