低接触电阻 WSe2p型晶体管,具有高度稳定的CMOS兼容剂
Inha Kim1,2, Naoki Higashitarumizu1,2,3, I K M Reaz Rahman1,2
1Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, United States.
Nano letters
|October 18, 2024
概括
化对化 (WSe2) 晶体管的化兴奋剂显著降低了接触电阻. 这一突破使得高性能p型晶体管具有更好的稳定性,用于先进的电子产品.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 纳米技术纳米技术
背景情况:
- 高接触电阻阻碍了基于过渡金属二甲基化物 (TMD) 的高性能p型晶体管的开发.
- 现有的兴奋剂方法往往与标准半导体制造工艺不兼容,或存在不稳定性.
研究的目的:
- 开发一种方法,在p型化 (WSe2) 晶体管中实现低接触电阻.
- 调查化 (PtCl4) 作为WSe2晶体管的p型剂的使用.
- 为了评估使用这种兴奋剂方法制造的WSe2晶体管的稳定性和性能.
主要方法:
- 使用化 (PtCl4) 作为p型剂,对少数层WSe2进行退化化.
- 制造顶端 WSe2 晶体管,其门长为 200 nm.
- 在各种条件下 (暴露在空气中,低温,真空) 描述接触阻力,切换行为和剂稳定性.
主要成果:
- 在WSe2晶体管中,每次接触的接触电阻低至0.23±0.07kΩ·μm.
- 在顶端设备中表现出良好的切换行为,这表明对门堆的dopant扩散最小.
- 具有很高的稳定性,设备在空气中保持了86天的性能,在真空中保持了78K的退行性兴奋状态.
结论:
- 化是一种有效的剂,用于在WSe2晶体管中实现低接触电阻.
- 开发的兴奋剂方法与补充性金属氧化物半导体 (CMOS) 制造工艺兼容.
- 剂和设备的高稳定性为可靠,高性能的p型TMD晶体管开辟了道路.
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