基和基替代的:合成和研究作为潜在的原子层沉积前体
Majeda Al Hareri1, Patricio Romero2, James F Britten3
1Department of Chemistry, McMaster University, 1280 Main St. West, Hamilton, Ontario L8S 4M1, Canada.
Inorganic chemistry
|October 21, 2024
概括
合成了新的含分子,具有重的基或基组. 这些化合物显示为元素的原子层沉积 (ALD) 的前体,为薄膜制造提供了一条新的途径.
科学领域:
- 有机金属化学 有机金属化学
- 材料科学 材料科学 材料科学
- 化学蒸汽沉积 化学蒸汽沉积
背景情况:
- 原子层沉积 (ALD) 需要挥发性和反应性前体来生长薄膜.
- 由于缺乏合适的前体,元素沉积具有挑战性.
- 固态阻碍的基和生殖基可以影响前体的稳定性和反应性.
研究的目的:
- 合成新型的基和基替代基,作为元素的潜在ALD前体.
- 为了研究这些新化合物的结构,热和化学特性.
- 评估它们在使用三化物协反应剂的ALD过程中的适用性.
主要方法:
- 金属西和细化合物的合成:超,超和三甲基细.
- 这些有机金属试剂与胺和化物前体 (例如,B(NMe2) Cl2,B(TMP) Cl2) 的反应.
- 结晶学表征,热稳定性分析,挥发性评估和ALD实验.
主要成果:
- 成功合成和表征了各种 silyl 和 germyl 替代的酸盐和一个酸盐.
- 报告了第一个混合的西/基替代, (tBu3Si) ((Me3Ge) B ((NMe2).
- 评估了热稳定性和挥发性,最初使用{(Me3Si) 3Si}2B(NMe2) 和三化物进行ALD试验.
结论:
- 新型西和细替代被开发为元素ALD的潜在前体.
- 合成策略允许创建各种替代模式.
- 需要进一步优化,但这项研究表明,为ALD前体的开发提供了一个有前途的途径.
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