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Updated: Jun 9, 2025

Theoretical Calculation and Experimental Verification for Dislocation Reduction in Germanium Epitaxial Layers with Semicylindrical Voids on Silicon
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在γ-GeSe的介层堆叠中发生的热诱导不可逆转的障碍

Joonho Kim1, Giyeok Lee2, Sol Lee1,3

  • 1Department of Physics, Yonsei University, Seoul, 03722, South Korea.

Small (Weinheim an der Bergstrasse, Germany)
|October 23, 2024
PubMed
概括

范德瓦尔斯 (vdW) 晶体中层间堆叠移动对于材料特性至关重要. 在 γ-GeSe 中,电气或热处理不可逆转地破坏了堆叠序列,影响了晶体的行为.

关键词:
焦力加热 焦力加热原子分辨率传输电子显微镜第一个原则是计算.层间层滑动的滑动方式堆积障碍是一种堆积障碍.γ-GeSeSe 的时间.

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