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Updated: Jun 9, 2025

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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基于扫描电子显微镜成像和值细分算法的电子束光刻中的残余电阻的定量评估

Qingyuan Mao1,2,3, Jingyuan Zhu1,2,3, Zhanshan Wang1,2,3,4

  • 1Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.

Nanotechnology
|October 23, 2024
PubMed
概括

一种新的定量方法准确地评估了电子束光刻中的电阻残留物,减少了昂贵的试错实验. 这种技术通过预测理想的暴露剂量以提高制造效率来优化纳米尺度的模式.

关键词:
电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束这是一个定量性的定量.剩余电阻的残留电阻值细分算法 值细分算法

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相关概念视频

Scanning Electron Microscopy01:07

Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
Fundamental Principles
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