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一种用于干电子束蚀刻电阻的模型

Fedor Sidorov¹, Alexander Rogozhin¹

¹Valiev Institute of Physics and Technology of Russian Academy of Sciences, Moscow 117218, Russia.

|October 26, 2024

概括

一个新的物理模型解释了用于微结构的电阻的干电子束蚀刻 (DEBER). 该模型澄清了配置文件的形成,使得这种高通量技术的优化能够用于先进的应用.

科学领域:

材料科学材料科学材料科学
纳米技术纳米技术
物理物理学物理

背景情况:

电阻的干电子束蚀刻 (DEBER) 是一个有前途的微观结构技术.
它的高吞吐量和简单性比其他方法具有优势.
在DEBER中形状形成的精确机制仍然不清楚,限制了优化.

研究的目的:

为DEBER.开发一个详细的物理模型.
为了阐明微结构概况在DEBER中形成的机制.
为了使DEBER技术的理论研究和优化.

主要方法:

开发了一个物理模型,包括e-beam散射,主链裂变,热脱聚合,单体扩散和阻抗回流.
实现了一个基于物理模型的模拟算法.
对模拟结果进行实验验证.

主要成果:

开发的物理模型准确地模拟了DEBER的轮形成.
实验验证证了模型的可靠性.
模拟估计了最终的DEBER特性:~300 nm的最小线宽和~70°的最大轮斜率.

结论:

物理模型为理解和优化DEBER提供了一个可靠的框架.
德伯能够制造出高分辨率的微观结构.
该模型有助于进一步推进基于DEBER的微型制造.

关键词:

这就是PMMA的PMMA.电子光束光刻 lithography 电子光束光刻热去聚合的热解聚合.热回流的热回流是指热的回流.

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