2O3,

Junichi Nomoto1, Takashi Koida2, Iwao Yamaguchi1

  • 1Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan.

PubMed
概括

优化喷雾条件,如水蒸气部分压力,射频功率和氧气流量,是创建高质量的氧化膜的关键,具有出色的导电性和透明度.