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在MRI阴性耐药和相关基因表达特征中的结构和功能变化

Ting Liu¹, Sheng Wang¹, Yingjie Tang²

¹Department of Neurology, The First Affiliated Hospital of Hainan Medical University, Hainan Province, PR China; Key Laboratory of Brain Science Research & Transformation in Tropical Environment of Hainan Province, Hainan Medical University, Haikou, PR China.

|November 4, 2024

概括

在耐药性患者的小脑中发现了结构性和功能性大脑变化. 这些变化可能与异常的基因表达有关,突出显示SP1.

科学领域:

神经成像是一种神经成像.
的研究研究.
遗传学是一个遗传学.

背景情况:

的研究经常使用神经成像,但MRI阴性耐药性 (DRE) 的结构/功能变化及其遗传基础尚不清楚.
了解这些机制对于开发针对DRE的向治疗至关重要.

研究的目的:

用MRI研究DRE患者的结构和功能性大脑变化.
探索与中耐药性相关的遗传机制.

主要方法:

结构性和功能性MRI扫描用于分析DRE,药物敏感性 (DSE) 和健康对照组的灰质体积 (GMV) 和区域同质性 (ReHo).
来自艾伦人类大脑图谱的基因表达数据与GMV/ReHo发现相关.
来自血液样本的真实转录数据与已识别的基因表达模式进行了比较.

主要成果:

在DRE患者的大脑中观察到显著的结构和功能变化.
在DRE患者中,这些小脑变化可能与药物耐药性的机制有关.
与神经系统发育相关的异常基因表达与观察到的DRE中的大脑形态和活动变化有关.

结论:

大脑小脑DRE的变化可能在药物耐药性中起作用.
在DRE患者中,大脑形态和区域活动的变化与异常基因表达有关.
转录因子SP1被认为是中耐药性机制的关键参与者.

关键词:

药物耐药性的治疗方法基因表达基因表达灰色物质体积,灰色物质体积.区域均性区域均性转录-神经成像协会分析分析.

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