纳米光子学适应性网格化策略使用后期错误估计

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Updated: Jul 12, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

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Albin J Svärdsby, Philippe Tassin

    Optics express
    |November 14, 2024
    PubMed
    概括

    适应性网状精细化通过减少计算成本和内存使用,加快纳米光子设备模拟的速度. 需要仔细实施,以避免网状传播问题,才能成功应用.

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