具有浮动聚合物和高k材料的高压FinFET可增强内在增益和安全操作区域
Kyounghwan Oh1, Hyangwoo Kim2, Yijoon Kim3
1Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, South Korea.
Scientific reports
|November 18, 2024
概括
我们开发了一种新的排水延长型FinFET (DeFinFET),使用浮式聚合物和分裂高k介电材料. 这种设计增强了内在增益,并将高压应用的电气安全操作区域 (SOA) 扩大了45%.
科学领域:
- 半导体设备物理学 半导体设备物理
- 先进的 MOSFET 结构
背景情况:
- 传统的排水扩展的FinFET (DeFinFET) 在内在增益和电气安全运行区域 (SOA) 上面临限制.
- 在漂移区域优化潜在下降和电场分布对于提高设备性能至关重要.
研究的目的:
- 引入一种新的DeFinFET结构,增强内在增益 (gm/gds) 和电气SOA.
- 研究浮动聚合物 (FP) 和高k (HK) 材料对排水潜力的利用和电场均性的影响.
主要方法:
- 提出了一个新的DeFinFET架构,在排水和漂移区域内结合浮动聚合物 (FP) 和分割高k (HK) 材料.
- 分析了在门启动状态下潜在下降配置和电场分布的控制.
- 评估设备性能,包括现状故障电压,准和行为和电阻.
主要成果:
- 在漂移区域实现了均的电场分布,从而导致更高的现状故障电压 (7.33V与5.89V).
- 即使在空间电荷调制后,也阻止了准和模式的运行,改善了内在增益 (gm/gds).
- 在漂移区域诱导电子积累,显著降低电阻,并将电 SOA 扩大 45%.
结论:
- 拟议的DeFinFET与FP和分割HK提供了优越的性能,与传统结构相比.
- 这种新的设计表明,由于增益,故障电压和SOA的改善,对高压应用具有显著的优势.
- 这些发现为更高效,更强大的功率半导体设备铺平了道路.
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