抛光工具的正常位移模型和补偿方法用于精密CNC抛光无球面的抛光
Yongjie Shi1, Min Su2, Qianqian Cao3
1School of Intelligent Manufacturing, Jiaxing Vocational Technical College, Jiaxing 314036, China.
Micromachines
|November 27, 2024
概括
本研究介绍了计算机数控 (CNC) 抛光系统的正常位移补偿方法. 该方法通过减少粗性和不均性,显著提高了aspheric表面质量.
科学领域:
- 制造业 工程 制造工程
- 光学工程是指光学工程.
- 材料科学 材料科学 材料科学
背景情况:
- 抛光工具的位置准确性对于无球面质量至关重要.
- 接触变形导致工具位移和抛光力变化.
- 现有的方法很难有效地解决这些错误.
研究的目的:
- 建议和验证CNC抛光系统的正常位移补偿方法.
- 为了控制抛光力,以减轻由变形引起的位置错误.
- 为了提高抛光无球元件的表面质量和均性.
主要方法:
- 分析了抛光力和工具位置之间的合.
- 根据赫茨的理论开发了一个正常位移模型.
- 在一个脱的CNC抛光系统中实施了一种补偿方法.
主要成果:
- 表面粗度从0.4微米减少到0.21微米.
- 降低了表面粗度的不均系数,从112.5%降至19%.
- 在抛光质量和均性方面表现出显著的改善.
结论:
- 拟议的正常位移补偿方法有效地增强了非球面抛光.
- 控制抛光力是补偿工具位置错误的可行策略.
- 该方法为实现更高质量和更均的无球面提供了一条途径.
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