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离子诱导的表面反应和沉积来自Pt(CO) ₂Cl₂和Pt(CO) ₂Br₂

Mohammed K Abdel-Rahman¹, Patrick M Eckhert¹, Atul Chaudhary²

¹Department of Chemistry, Johns Hopkins University, Baltimore, MD, 21218, USA.

Beilstein journal of nanotechnology

|November 27, 2024

概括

这项研究揭示了膜的离子束诱导沉积 (IBID) 始于从前体分子中 CO 联体的吸附. 随后通过离子喷PtX2物种,最终产生纯膜.

科学领域:

材料科学材料科学材料科学
表面科学是一门学科.
薄膜沉积的情况

背景情况:

离子束诱导沉积 (IBID) 是一种制造薄膜的技术.
了解IBID的基本步骤对于控制电影属性至关重要.
在IBID中使用 (Pt) 前体,如Pt(CO) 2Cl2和Pt(CO) 2Br2.

研究的目的:

为了研究的离子束诱导沉积 (IBID) 中的基本反应步骤.
阐明前体分子和离子表面相互作用的作用.
了解使用特定前体和离子束的纯 Pt 薄膜的形成.

主要方法:

使用超高真空 (UHV) 表面科学技术.
研究了Pt(CO) 2Cl2和Pt(CO) 2Br2的单层薄膜,暴露在3keV的Ar+,He+和H2+离子中.
采用X射线光电子光谱 (XPS),质谱和奥格电子光谱 (AES) 进行分析.

主要成果:

沉积启动涉及由于离子运动量转移而导致的CO联体脱离.
前体的分解形成了易发性PtX2物种,随后发生了离子诱导的喷.
当Pt喷射速率超过临界离子剂量的素喷射速率时,纯Pt膜会形成.

结论:

在IBID中,基本反应步骤的顺序在不同的离子/前体组合中是不变的.
较重的离子 (例如Ar+) 会导致更快的二氧化碳吸附和喷.
基本的UHV表面科学研究为优化IBID流程提供了关键的见解.

关键词:

存款方式存款方式存款方式离子束的离子束.纳米结构是一种纳米结构.有机金属有机金属一个前体的前体.

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