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在纳米尺度门周围的MOSFET中对量子束的紧建模
Baokang Peng1, Yanxin Jiao1, Haotian Zhong1
1School of Electronic and Computer Engineering, Peking University, Shenzhen 518055, China.
Fundamental research
|December 11, 2024
概括
这项研究提出了一个新的表面电位模型,用于门全方位 (GAA) MOSFET,考虑到量子束效应. 该模型准确地预测设备的行为,确保对先进的GAA技术进行可靠的电路模拟.
科学领域:
- 半导体设备物理学 半导体设备物理
- 先进的 MOSFET 建模
- 在纳米电子学中的量子力学.
背景情况:
- 门全方位 (GAA) MOSFET对于未来的集成电路至关重要.
- 量子束效应在最终扩展时变得显著,影响设备性能.
- 精确的紧型模型是电路设计和模拟所需的.
研究的目的:
- 为最终缩放的GAA MOSFETs开发一个基于表面电位的紧模型.
- 将量子封闭和子频段效应纳入模型.
- 为了验证模型的准确性和稳定性,用于电路应用.
主要方法:
- 解决Poisson方程与内置的子频段效应,以开发一个分析表面电位模型.
- 将表面电位模型与现有传输框架集成,以导出电荷电压和电流电压特征.
- 使用TCAD模拟和来自纳米板GAA MOSFETs的实验数据进行了广泛的验证.
主要成果:
- 一个经过验证的GAA MOSFET分析表面电位模型,包括量子束.
- 精确的电荷 - 电压和电流 - 电压的配方,从表面潜力.
- 通过电路模拟来证明模型的稳定性和融合.
结论:
- 开发的紧型模型有效地捕捉了缩放的GAA MOSFET中的量子限制.
- 该模型为设计和模拟先进的GAA技术提供了可靠的工具.
- 经验证的模型确保准确预测设备和电路的行为.
相关概念视频
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