在低温下,Mo和W底层对Fe-Au-Pd多层薄膜中有序相位形成的影响
Szilvia Gulyás1,2, Gábor L Katona1
1Department of Solid State Physics, Faculty of Sciences and Technology, University of Debrecen, P.O. Box 400, H-4002, Debrecen, Hungary.
Heliyon
|December 13, 2024
概括
添加金 (Au) 介层显著影响薄膜中有序的Fe-Pd相的形成,无论底层的缓冲层是 (Mo) 或 (W),都会促进特定的结构. 这个金色的中间层.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜技术 薄膜技术
- 固态物理 固态物理
背景情况:
- 在磁性应用中,Fe-Pd薄膜至关重要.
- 控制这些膜的相位形成和排序对于调整它们的特性至关重要.
- 了解介层和缓冲层的作用是优化制造过程的关键.
研究的目的:
- 研究黄金 (Au) 中间层对Fe-Pd薄膜相位形成和排序的影响.
- 为了比较Au介层与Mo和W缓冲层对Fe-Pd薄膜性能的影响.
- 阐明在高达460°C的热温度下控制相位形成的机制.
主要方法:
- 在SiO2,SiO2/Mo和SiO2/W基板上制造Fe-Pd基薄膜,有或没有Au中间层.
- 磁铁子喷用于薄膜沉积.
- 在真空中在高达460°C的温度下进行后化.
- 化学深度分析和X射线衍射用于材料特性.
主要成果:
- Au中间层始终促进了FePd3相与L12有序结构的形成,除非存在W底层.
- 在带有Mo缓冲器但没有Au的样本中,FePd相形成,L10有序相以一个堆叠顺序出现.
- 阶段形成归因于粒边界扩散和应力放松机制.
结论:
- 黄金 (Au) 介层在Fe-Pd薄膜相位形成中起着主导作用,取代了Mo或W缓冲层的影响.
- 颗粒边界扩散和应力积累是在中等回火温度下形成有序Fe-Pd相的关键机制.
- 该研究强调了介层对Fe-Pd薄膜结构演变的关键影响.
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