在谷 photonic 晶体的集成拓界面中量化对曲的强度
Chao-Heng Guo1, Guo-Jing Tang1, Meng-Yu Li1
1School of Physics & State Key Laboratory of Optoelectronic Materials and Technologies, Sun Yat-sen University, Guangzhou 510275, China.
Nanophotonics (Berlin, Germany)
|December 16, 2024
概括
谷 photonic 晶体 (VPC) 能够在尖的曲处进行强大的光传播,这对于紧的光子设备至关重要. 这项研究量化了集成VPC中的超低曲损失,证明了它们对密集光电路集成的潜力.
科学领域:
- 拓性光子学是一个专业的专业.
- 综合光子学 综合光子学
- 纳米光子学 纳米光子学
背景情况:
- 敏曲的波导对于小型化光子设备至关重要.
- 拓光子学提供强大的光传播,减轻集成电路中的损失.
- 在拓界面中量化曲损失对于设备设计至关重要.
研究的目的:
- 实验性地描述谷 photonic 晶体 (VPC) 中集成的拓接口的曲强度.
- 为量化与基于VPC的光子电路中的急转相关的超低曲损失.
- 展示VPC在实现光子设备密集集成方面的潜力.
主要方法:
- 在破碎的反向对称性的在绝缘体平台上设计VPC.
- 构建四种类型的拓接口,重点是齐克扎克-AA接口.
- 制造具有不同转数的VPC接口,并测量曲损失 (每120度转<0.02dB).
主要成果:
- 实验证明了曲损失的超低 (每120度转<0.02dB) 在齐克扎格-AA VPC接口.
- 在集成的拓界面中传播损失的表征.
- 验证VPCs能够抑制来自曲的反向散射的能力.
结论:
- VPC拓接口表现出了显著的强度,可以抵抗急剧曲,损失最小.
- 这些发现为拓纳米光子设备的密集集成铺平了道路.
- 这项工作为设计先进的光子电路提供了曲损失的关键量化.
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