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Updated: Jun 13, 2026

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures
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Published on: December 5, 2015

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在晶圆尺度共相锡化物层中以Piezostrain驱动的双向增强光学突触可塑性

Changhyeon Yoo1, Sang Sub Han1, Chung Won Lee1

  • 1NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States.

Nano letters
|December 18, 2024
PubMed
概括

这项研究引入了新二氧化 (SnSe2-x) 2D材料,具有结合的机械和光电性能. 这些材料显示了对神经形态设备应用的增强突触响应.

关键词:
2D SnSe2−xx 的情况.人工突触是一种人造突触.神经形态应用 神经形态应用焦点光子电子技术 (Piezo-photronics) 是一个突触性可塑性 突触性可塑性锡化 (tin selenide) 是一种化.

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相关概念视频

Biasing of Metal-Semiconductor Junctions01:27

Biasing of Metal-Semiconductor Junctions

Biasing metal-semiconductor junctions involves applying a voltage across the junction. Specifically, the metal is connected to a voltage source, while the semiconductor is grounded. This technique is essential for controlling the direction and magnitude of current flow in electronic devices, including diodes, transistors, and photovoltaic cells.
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...