本质上是光敏感的聚胺光电阻及其双重交联机制
Peng Yang1, Haiping Yu1, Yuting Zhu1
1Shandong Provincial Key Laboratory of Photoresist, College of Chemistry, Chemical Engineering and Materials Science, Shandong Normal University, Jinan 250014, P. R. China. yangpeng@sdnu.edu.cn.
Chemical communications (Cambridge, England)
|December 20, 2024
概括
一种新的无光启动器聚胺被创建用于光电法. 这种新材料使用烯进行紫外线启动的交叉链接,实现10微米分辨率,无需强化学品.
科学领域:
- 聚合物化学 聚合物化学
- 材料科学 材料科学 材料科学
- 摄影石刻法 (photolithography) 是一种光刻法.
背景情况:
- 聚胺是先进的聚合物,具有出色的热和机械性能.
- 传统的光刻工艺往往依赖于光启动器和苛刻的化学物质,这给环境和加工带来了挑战.
- 开发无光启动器系统对于更环保,更高效的微型制造至关重要.
研究的目的:
- 开发一种新的负面处理,无光启动器的聚胺,用于先进的光刻应用.
- 将光敏和交联功能直接集成到聚胺结构中.
- 为了建立一个简化和更安全的合成路由功能化聚胺.
主要方法:
- 一种新型预功能化二胺单体的合成.
- 将索单元纳入聚胺骨干.
- 在聚胺侧链中引入甲基酸盐交叉连接组.
- 使用i线 (365nm) 紫外线照射的光电学实验.
主要成果:
- 成功合成了一种无光启动器的聚胺,具有集成的光敏感性.
- 在紫外线暴露时,索部分有效地启动了交叉链接反应.
- 通过10微米的分辨率表现出极好的光刻性能.
- 在合成过程中避免使用腐蚀性硫尼尔化物.
结论:
- 开发的聚化物为无光启动器的光成像提供了一个有前途的替代方案.
- 集成的类和甲基酸盐组使得UV诱导的高效交叉链接成为可能.
- 这种方法简化了过程,并通过消除危险试剂来提高安全性.
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