:

Nicolai Simon1,2, Thomas Stieglitz2,3,4, Volker Bucher1

  • 1Institute for MicroSystems Technology (iMST), Faculty of Mechanical & Medical Engineering, Furtwangen University, D-78120, Furtwangen im Schwarzwald, Germany.

PubMed
概括

区域选择性原子层沉积 (ASD) 允许无缺陷的半导体制造,并增强活跃的植入物. 本综述探讨了医疗应用的ASD过程,包括生物传感器和可植入电极.

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