一个低开关损失的GaN沟MOSFET设计,采用三重盾结构
Yihang Qiu1, Li Wei2
1College of Information and Control Engineering, Jilin Institute of Chemical Technology, Jilin, 132022, China.
Scientific reports
|January 3, 2025
概括
一种新的化 (GaN) 沟MOSFET具有三重盾结构,可显著降低门排水负荷 (Qgd). 这一创新降低了寄生电容,提高了功率电子应用的设备性能.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 化 (GaN) MOSFET对于高频和高功率应用至关重要.
- 降低寄生门排水负荷 (Qgd) 对于提高MOSFET的切换性能和效率至关重要.
研究的目的:
- 提出和研究一种具有超低道排水负荷 (Qgd) 的创新GaN沟MOSFET设计.
- 通过使用 TCAD 模拟来分析新设计的操作机制.
主要方法:
- 技术计算机辅助设计 (TCAD) 模拟被用于研究设备物理.
- 设计和分析了一种新的三重盾结构,称为BPSG-MOS.
- 拟议的结构包括一个接地分裂门 (SG),一个P+盾区域 (PSR) 和一个半包装的BP层.
主要成果:
- BPSG-MOS设计显著减少了通过SG和PSR组件的门-排水合.
- 该BP层通过将侧墙Cgd转换为门源电容 (Cgs) 来进一步改进门排水电容 (Cgd).
- 与PSGT-MOS和TG-MOS相比,BPSG-MOS分别降低了81%和98%的Cgd,导致了超低的Qgd.
结论:
- 拟议的BPSG-MOS结构有效地将GaN沟MOSFET中的门-排水负荷 (Qgd) 降至最低.
- 这种新的设计在降低寄生电容方面提供了实质性的改进,为更高效的动力设备铺平了道路.
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