铁磁Heusler道连接处具有快速旋转转移扭矩切换,低磁化使其成为可能
Chirag Garg1, Panagiotis Ch Filippou2, Ikhtiar3
1IBM Research-Almaden, San Jose, CA, USA. chirag.garg1@ibm.com.
Nature nanotechnology
|January 3, 2025
概括
研究人员使用低磁化合金开发了先进的磁道连接内存设备. 这一突破通过减少写入切换电流,使得更快,更可扩展的磁性随机访问存储器 (MRAM) 成为可能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 电气工程 电气工程
背景情况:
- 磁性随机访问存储器 (MRAM) 提供了高性能和非挥发性,超过了传统的基于充电的存储器.
- 当前的MRAM速度受到其内存存储层高磁化的限制.
- 克服这一局限性对于推进超越当前节点的内存技术至关重要.
研究的目的:
- 设计具有低磁化存储层的磁道连接 (MTJ) 记忆器件.
- 调查使用铁磁Heusler合金用于下一代MRAM的可行性.
- 用新材料在MTJ设备中证明可靠的开关和磁阻.
主要方法:
- 使用低磁化铁磁Heusler合金 (Mn3Ge) 作为存储层制造MTJ存储器.
- 在无形基板上实施化物种子层和化学模板层.
- 使用纳秒写出脉冲的磁状态切换的表征和测量道磁电阻 (TMR).
主要成果:
- 成功制造了在无形基板上使用Mn3Ge存储层的MTJ存储器件.
- 通过使用纳秒脉冲实现了可靠的磁性状态切换,写错率为10^-7.
- 在环境温度下检测到87%的显著道磁电阻 (TMR).
结论:
- 使用低磁化铁磁Heusler材料,如Mn3Ge,为MRAM提供了一个可行的策略.
- 这种方法促进了较低的写入切换电流,为MRAM扩展铺平了道路.
- 开发的MTJ设备展示了超越当前铁磁限制的高性能,非挥发性内存的潜力.
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