接口层提高了高流动性和交换机比率在范德瓦尔斯电子的电子
Chi Zhang1,2, Enlong Li1,2, Caifang Gao1,3
1Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai 200433, China.
在硫化 (ReS2) 场效应晶体管中引入牺牲层显著提高了移动性和电流开/关比,同时减少了离电流,从而实现了先进的集成电路.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 二维场效应晶体管 (2D-FETs) 需要高流动性和低功耗,用于实际应用.
- 尽量减少非电流和静电功率对于2D-FET的可扩展性至关重要.
- 肖特基障碍和接口缺陷通常会限制2D-FET的性能.
研究的目的:
- 通过引入 (Se) 牺牲层来提高硫化 (ReS2) 晶体管的性能.
- 调查Se层对设备特征的影响,包括移动性,非电流和电流密度.
- 为了证明Se保护的ReS2晶体管在逻辑电路应用中的可行性.
主要方法:
- 使用半导体和源/排水电极之间集成的 (Se) 牺牲层制造ReS2晶体管.
- 制造出来的设备的回后处理.
- 晶体管的电气特征,包括移动性测量,电流开/关比,在低温 (7K) 状态下关闭电流.
- 理论计算和噪声分析,以了解性能改善的潜在机制.
主要成果:
- 实现了异常电流的显著减少和异常电流密度的显著增加.
- 观察到异常的设备性能,移动性达到237cm2V-1s-1和电流开/关比为1011在7K.
- 理论和噪声分析证实,Se层起到了保护性屏蔽的作用,减少了Schottky屏障和接口缺陷状态.
结论:
- 牺牲层通过减轻接口问题有效地提高了ReS2晶体管的性能.
- 增强的ReS2晶体管显示出在高性能集成电路中使用的潜力.
- 多功能逻辑电路,包括NAND和NOR门,使用Se保护的ReS2晶体管成功制造.
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