化薄膜的化学,结构和机械性质的演变 具有不同厚度的化薄膜是使用脉冲直流磁铁龙喷射制造的
Wei Mao1, Runze Qi1,2, Jiali Wu1
1MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, China.
Materials (Basel, Switzerland)
|January 8, 2025
概括
化 (TiN) 薄膜用于X射线望远镜镜子进行了研究. 一个25纳米的TiN薄膜提供了最佳的性能,平衡了电成复制的减少应力和粗性.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜技术 薄膜技术
- 纳米技术纳米技术
背景情况:
- 化 (TiN) 薄膜作为释放层在制造使用电成型复制 (ENR) 的沃尔特-I X射线望远镜镜中至关重要.
- 了解纳米尺度厚度变化对TiN薄膜性能的影响对于优化ENR过程至关重要.
研究的目的:
- 研究TiN薄膜厚度 (9.8nm至42.9nm) 对微观结构,元素深度分布,表面形态和内在应力的影响.
- 为了确定最佳的TiN薄膜厚度,用于作为X射线望远镜镜子在ENR中的释放层.
主要方法:
- 使用脉冲直流 (DC) 磁喷射制造TiN薄膜.
- 对薄膜微观结构,元素深度形状,表面形态 (粗度) 和内在应力演变与厚度的全面分析.
主要成果:
- TiN薄膜从无形结构转变为晶体结构,厚度不断增加,呈现混合的 (200) 和 (111) -200) 方向.
- 元素组成和化学结合因深度而异,允许优化薄膜密度的适配.
- 加大晶体尺寸与厚度导致内在应力减少,但表面粗度增加.
结论:
- TiN薄膜厚度显著影响其微观结构,应力和粗性.
- 约25nm的TiN薄膜厚度被认为是最佳的,在ENR应用中提供了低内在应力和可接受的表面粗度之间的平衡.
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