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相关概念视频

Brain Abscess l: Introduction01:26

Brain Abscess l: Introduction

A brain abscess is a focal, intracerebral infection characterized by a localized collection of pus within the brain parenchyma, resulting from microbial invasion and the body’s inflammatory response. It progresses through stages: early and late cerebritis, followed by early and late capsule formation, reflecting tissue destruction, immune response, and eventual encapsulation.Etiology and PathogenesisCausative organisms vary with source and host factors, often involving polymicrobial infections,...

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Micro/Nano-scale Strain Distribution Measurement from Sampling Moiré Fringes
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一个改进的算法,以提取Moiré边缘阶段的晶圆-面具对齐在纳米印迹石版画中.

Feifan Xu1,2,3, Yinye Ding2, Wenhao Chen3

  • 1Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei 230009, China.

Micromachines
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概括

这项研究介绍了一种先进的Moiré边缘阶段提取算法,用于纳米印记 lithography 晶圆-面具对齐. 新方法提高了对齐精度到纳米级,超过现有技术.

关键词:
石版画对齐对齐 石版画对齐对齐不对齐测量测量的错位.莫伊尔的边缘技术纳米印记 lithography 石版印刷 的使用.阶段提取算法相位提取算法

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Design and Development of a Three-Dimensionally Printed Microscope Mask Alignment Adapter for the Fabrication of Multilayer Microfluidic Devices
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科学领域:

  • 纳米技术纳米技术
  • 计量学 计量学 计量学
  • 光学工程是指光学工程.

背景情况:

  • 精确的晶圆-面具对齐对于纳米印记光刻技术至关重要.
  • 像2D-FFT和2D-WFF这样的现有方法在速度和准确性方面存在局限性.
  • 莫雷边缘分析是精确对齐测量的关键技术.

研究的目的:

  • 为Moiré fringes.开发一个改进的相提取算法.
  • 为了提高晶圆-面罩对齐准确度在纳米印记光刻.
  • 克服现有的2D-FFT和2D-WFF方法的局限性.

主要方法:

  • 结合2D-FFT和2D-WFF,实现高效的基本频率提取.
  • 使用局部频谱值来消除噪音.
  • 采用高斯窗口来抑制光谱泄漏,避免参数调整.

主要成果:

  • 实现了纳米级的对齐精度.
  • 与2D-FFT相比,表现出了15.8%的改善.
  • 与2D-WFF相比,显示了6.6%的改善.
  • 通过模拟和实验结果验证.

结论:

  • 拟议的算法为晶圆-面罩对齐提供了卓越的准确性和效率.
  • 它有效地解决了噪音和光谱泄漏问题.
  • 该方法对于纳米印迹光刻应用是可行的和合理的.