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Updated: Jun 1, 2026

Micro/Nano-scale Strain Distribution Measurement from Sampling Moiré Fringes
06:56

Micro/Nano-scale Strain Distribution Measurement from Sampling Moiré Fringes

Published on: May 23, 2017

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一个改进的算法,以提取Moiré边缘阶段的晶圆-面具对齐在纳米印迹石版画中

Feifan Xu1,2,3, Yinye Ding2, Wenhao Chen3

  • 1Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, Hefei University of Technology, Hefei 230009, China.

Micromachines
|January 8, 2025
PubMed
概括

这项研究介绍了一种先进的Moiré边缘阶段提取算法,用于纳米印记 lithography 晶圆-面具对齐. 新方法提高了对齐精度到纳米级,超过现有技术.

关键词:
石版画对齐对齐 石版画对齐对齐不对齐测量测量的错位.莫伊尔的边缘技术纳米印记 lithography 石版印刷 的使用.阶段提取算法相位提取算法

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