用 (C2H4/He) 稀释乙烯的蚀刻化学过程优化,用于互连集成
Hwa-Rim Lee1, Eun-Su Jung1, Jin-Uk Yoo1
1School of Integrative Engineering, Chung-Ang University, 84, Heukseok-ro, Dongjak-gu, Seoul 06974, Republic of Korea.
Micromachines
|January 8, 2025
概括
在蚀过程中选择乙烯 (C2H4) 而不是 (N2) 作为被动化气体,会产生较薄,较弱的聚合物,含残留较少. 这会影响半导体互连的完整性.
科学领域:
- 材料科学 材料科学 材料科学
- 化学工程是化学工程的重要组成部分.
- 半导体制造业 半导体制造业
背景情况:
- (Al) 互连在半导体设备中至关重要.
- 蚀刻过程可以在Al侧壁上形成聚合物,影响设备性能.
- 化气体在蚀刻过程中控制聚合物形成起到作用.
研究的目的:
- 为了研究不同被动化气体在Al蚀刻过程中对聚合物特性的影响.
- 为了比较 (N2) 和以 (C2H4/He) 稀释的乙烯的影响.
- 分析聚合物组成,厚度,强度和残留水平.
主要方法:
- 使用N2和C2H4/He被动化气体形成的聚合物的比较分析.
- 聚合物厚度,强度和元素组成 (C,O) 的表征.
- 测量后的残留含量.
主要成果:
- 与 (N2) 相比,乙烯 (C2H4) 产生了较薄,较弱的聚合物.
- 用C2H4形成的聚合物具有较低的残留含量.
- 元素分析显示,C2H4基聚合物的碳含量较低,氧含量较高.
结论:
- 选择被动化气体显著影响在Al蚀刻过程中聚合物的特性.
- C2H4是N2的一个有希望的替代品,用于优化Al蚀刻工艺.
- 了解这些影响对于提高基于人工智能互连的可靠性至关重要.
相关概念视频
01:12Cycloaddition Reactions: MO Requirements for Photochemical Activation
2.0K
Some cycloaddition reactions are activated by heat, while others are initiated by light. For example, a [2 + 2] cycloaddition between two ethylene molecules occurs only in the presence of light. It is photochemically allowed but thermally forbidden.
2.0K
01:05High-Performance Liquid Chromatography: Elution Process
419
In High-Performance Liquid Chromatography (HPLC), the elution process is critical to the separation of analytes and the quality of chromatographic results. Elution describes how compounds move through the column and separate based on their interactions with the mobile and stationary phases. This process determines the resolution, peak shape, and retention times in the chromatogram, which are essential for identifying and quantifying components in complex mixtures. Understanding the elution...
419