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Updated: Jun 3, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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化学潜力的工作偏差路径采样计算:氧化的原理和应用

Orane Barbour1, Jean-Paul Crocombette1, Theo Beigbedder2

  • 1CEA, Service de recherche en Corrosion et Comportement des Matériaux, SRMP, Université Paris-Saclay, Gif sur Yvette F-91191, France.

The Journal of chemical physics
|January 8, 2025
PubMed
概括

我们开发了一种新方法来计算原子模拟中的化学潜力. 这项技术揭示了氧气集群稳定性如何影响二氧化的化学潜力,揭示了温度和组成的不规则模式.

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