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Updated: May 12, 2026

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
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在不同的SiOx表面上,DNA原形吸附和晶格形成

Bhanu Kiran Pothineni1, Chantal Theile-Rasche1, Hendrik Müller1

  • 1Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098, Paderborn, Germany.

Chemistry (Weinheim an der Bergstrasse, Germany)
|January 8, 2025
PubMed
概括

用于分子光刻的DNA原始格子在特定的氧化 (SiOx) 表面上表现最好. 表面粗度和氧化物密度是成功在SiOx膜上进行DNA原始体自组装的关键因素.

关键词:
吸附方式 吸附方式 吸附方式基因原始的DNA原始化格子格子是一个格子格子.自动组装自动组装氧化是氧化的一种.

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