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对N2H3潜在能量表面的压力依赖动力学分析

Michal Keslin1, Kfir Kaplan1, Alon Grinberg Dana1,2

  • 1Wolfson Department of Chemical Engineering, Technion - Israel Institute of Technology, Haifa 3200003, Israel. alon@technion.ac.il.

Physical chemistry chemical physics : PCCP
|January 14, 2025
PubMed
概括

本研究详细介绍了N2H3潜在能量表面的压力依赖反应,包括一个新的同位素NH3N. 新的速率系数对于模拟氨和素燃烧至关重要.

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