,

Takumi Murai1, Riku Miyakawa1, Yu Obata1

  • 1Graduate School of Science and Technology, Niigata University, 8050 Ikarashi 2-no-cho, Nishi-ku, Niigata City, Niigata 950-2181, Japan.

概括

使用激发发射矩阵 (EEM) 光谱分析了大豆缺陷的光特性. 特定的光谱变化确定了生病,害虫和变质的大豆,有助于检测缺陷.