制造工艺对二维p型WSe2场效应晶体管性能的影响
Jingmei Tang1, Kun He1,2, Ping Lu1
1Hunan Provincial Key Laboratory of Two-Dimensional Materials, State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, Changsha 410082, China.
二维过渡金属二甲基化物 (TMD) 纳米制造影响了设备的性能. 电子束暴露和紫外线光刻会降低WSe2质量,但激光图案提供了高性能替代方案.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术 纳米技术
- 凝聚物质物理学 凝聚物质物理学
背景情况:
- 像WSe2这样的二维 (2D) 过渡金属二化物 (TMD) 是下一代电子产品的关键.
- 纳米制造对内在TMD属性的影响尚未得到充分理解.
研究的目的:
- 调查标准纳米制造步骤如何影响WSe2设备的性能.
- 识别有害的工艺,并提出改进的制造方法.
主要方法:
- 原始的p型WSe2设备的制造和电气特性.
- 对电子束暴露和UV光刻效应的系统分析.
- 开发一种使用激光图案和转移电极的混合方法.
主要成果:
- 电子束暴露通过兴奋剂和扩散改变了WSe2的导电性.
- 在NaOH开发器中进行紫外线光刻会导致显著的WSe2降解 (40%-84%).
- 激光图案实现了具有高电流密度和开/关比的高性能设备.
结论:
- 纳米制造过程极大地影响TMD设备的性能.
- 电子束和紫外线光刻的步骤需要仔细的控制或替代方法.
- 激光图案与传输电极相结合是高性能TMD设备的可行策略.
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