超级缩放真空门介电MoS2电场效应晶体管的性能评估:避免辐射环境中的氧化物不稳定性
Khalil Tamersit1,2, Abdellah Kouzou3,4, José Rodriguez5
1National School of Nanoscience and Nanotechnology, Abdelhafid Ihaddaden Scientific and Technological Hub, Sidi Abdellah, Algiers 16000, Algeria.
Micromachines
|January 25, 2025
概括
使用真空门介电材料 (VGD) 的超级缩放过渡金属二二烯化物场效应晶体管 (FET) 在恶劣环境中显示出增强的性能和稳定性. 这种真空门介电方法为辐射硬化纳米电子提供了一个有希望的解决方案.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体物理 半导体物理
背景情况:
- 纳米级场效应晶体管 (FET) 中的门介电材料在恶劣环境 (如放射性条件) 中容易产生不稳定性,这会影响设备的可靠性.
- 超级缩放的FET需要强大的门介电解决方案,以在极端条件下保持性能.
研究的目的:
- 为了评估超级缩放过渡金属二二化物 (TMD) FETs使用真空门介电器 (VGD) 的性能.
- 调查VGD在纳米电子设备中克服氧化物相关不稳定性的潜力.
主要方法:
- 使用量子模拟对纳米设备进行计算评估.
- 在弹道运输制度下Poisson和量子运输方程的自相一致的解决方案.
- 分析传输特征,下值波动,开/关电流,电流比率和扩展极限.
主要成果:
- 门周围 (GAA) VGD TMD FET 显示出异常的静电控制,弥补了 VGD 的低介电常数.
- 在超级调节模式下实现了优异的开关性能,其特点是高电流比率和的下值特征.
- VGD TMD FET表现出增强的稳定性,这对于在恶劣环境中可靠运行至关重要.
结论:
- 该GAA-VGD TMD FET是一个非常有前途的候选先进的辐射硬化纳米电子.
- 该VGD方法有效地解决了与超大尺度FET中的传统氧化物介电物相关的不稳定性问题.
- 这项技术为更具弹性和可靠的纳米电子设备铺平了道路,用于要求更高的应用.
关键词:
现在的比率比率是当前比率.现场效应晶体管 (FET) 的使用非平衡的绿色函数 (NEGF)氧化物不稳定性的氧化物.在下值波动 (SS) 时.切换的切换 切换的切换过渡金属二甲基化物 (TMD) 是一种真空门介电器 (VGD) 是一个更多相关视频
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