设计和研究一种新的P型无连接FET,用于CMOS逆变器的高性能
Bin Wang1, Ziyuan Tang1, Yuxiang Song1
1State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China.
Micromachines
|January 25, 2025
概括
使用部分耗尽的在绝缘体技术的新型p型无连接场效应晶体管 (PJLFET) 提供了卓越的性能. 这种先进的晶体管设计实现了高开/关电流比,并降低了值电压,以便在高性能芯片中潜在使用.
科学领域:
- 半导体设备物理学 半导体设备物理
- 通过先进的晶体管技术,实现了先进的晶体管技术.
背景情况:
- 部分耗尽的在绝缘体 (PD-SOI) 技术对于现代集成电路至关重要.
- 无连接场效应晶体管 (JLFET) 提供了简化制造和更好的可扩展性.
- 在p型JLFET中实现有效的关机和高性能仍然是一个挑战.
研究的目的:
- 提出并研究基于PD-SOI的新型p型无连接场效应晶体管 (PJLFET).
- 为了提高PD-SOI PJLFET的电气特性和操作机制.
- 探索拟议的PJLFET在CMOS电路应用中的潜力.
主要方法:
- 使用 TCAD 工具进行设备模拟.
- 整合一个埋藏的N+合层来控制通道潜力.
- 使用拟议的PJLFET和传统的NMOSFET设计和模拟一个CMOS逆变器.
主要成果:
- 拟议的PJLFET实现了超过七个数量级的Ion/Ioff比率.
- 实现了2.56×10−4A/μm的Ion,以及低至3.99×10−12A/μm的Ioff.
- 在CMOS逆变器中证明了降低0.43V的值电压和相应的上拉/下拉能力.
结论:
- 新型PD-SOI PJLFET具有出色的电气特性,包括高开/关比和低离位电流.
- 集成的埋藏的N+兴奋剂层有效地使设备关闭并优化性能.
- 拟议的PJLFET显示了未来高性能集成电路应用的巨大潜力.
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