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|January 29, 2025

概括

绝缘体上晶片的颜色表明了层的厚度. 这种视觉估计有助于优化光子设备的制造.

科学领域:

材料科学材料科学材料科学
光电学是指光电子产品.
薄膜物理学薄膜物理学

背景情况:

在先进的半导体设备中,在绝缘体 (SOI) 晶圆至关重要.
控制蚀刻的 (Si) 层的厚度对于设备的性能至关重要.
对于薄膜厚度的视觉检查方法对于过程优化是非常理想的.

研究的目的:

为了研究蚀刻SOI晶片的视觉颜色与表面层厚度之间的关系.
了解负责观察到的颜色变化的光学现象.
建立一种基于视觉颜色的估计厚度的方法.

主要方法:

从具有不同蚀刻Si层厚度 (90nm至30nm) 的SOI晶圆测量反射频谱.
多层光学反射率计算,以建模观察到的光谱图案.
对Fabry-Perot标准效应和薄膜干扰在Si和埋藏的SiO2层中的分析.

主要成果:

随着Si的厚度的减少,SOI晶圆的颜色从绿到紫色到金色不等.
反射曲线表现出一个振幅调制的振荡模式.
埋藏的SiO2层起到Fabry-Perot标准的作用,而Si吸收则调节可见光谱.
由于波长依赖调制,观察到的颜色与Si厚度直接相关.

结论:

蚀刻的SOI晶片的视觉颜色为估计层厚度提供了一种可靠的,非破坏性的方法.
这种视觉估计对于优化制造光子设备的蚀刻过程是有价值的.
通过反射分析,可以对Si和埋藏的SiO2层进行准确的厚度测量.

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