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基于激光热结合微干扰成像技术的激光热,对化光学中的吸收缺陷进行高效和敏感的检测
Optics letters
|January 31, 2025
概括
一种新的激光热与微干扰成像 (LTP-MII) 方法相结合,可以有效地检测化光学中的吸收缺陷. 这种敏感的技术甚至显示了ppm级吸收,这对于光学元件质量控制至关重要.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 非破坏性测试是指非破坏性测试.
背景情况:
- 化光学是各种高功率激光系统中的关键组件.
- 检测微妙的吸收缺陷对于保持光学性能和防止损坏至关重要.
- 现有的方法可能缺乏用于ppm级缺陷检测所需的灵敏度或效率.
研究的目的:
- 提出和验证一种新,高效和敏感的方法来检测化光学中的吸收缺陷.
- 为了研究激光热功率密度和诱导热变形之间的关系.
- 证明拟议方法在表征不同类型的表面缺陷方面的能力.
主要方法:
- 在激光热 (LTP) 下开发了一种多物理场方法,用于在激光热 (LTP) 下模拟化光学的热变形.
- 构建了一个LTP-MII系统,使用355nm的LTP点和白光微干涉计成像仪.
- 在各种化样本上实验评估了该方法,控制了缺陷和吸收水平.
主要成果:
- 模拟预测了2.1纳米变形的ppm级吸收与600-W/mm2LTP功率密度.
- 实验结果显示,薄膜吸收 (75.3 nm),断裂坑 (27.8 nm) 和划痕 (5.2 nm) 的热变形特征在19.5 W/mm2.2时明显.
- 一个超光滑的基板在19.5W/mm2时没有变形,但在110.7W/mm2时呈现13.31nm,表明功率密度和变形之间存在正相关性.
结论:
- 激光热结合微干扰成像 (LTP-MII) 是一种高效和敏感的技术,用于检测化光学中的吸收缺陷.
- 该方法有效地根据其光热吸收特性区分各种缺陷类型.
- 在光学制造业中,LTP-MII显示了质量控制和材料表征的巨大潜力.
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