-EBSD-CL,Cu(In,Ga) S2

Yucheng Hu1, Gunnar Kusch1, Damilola Adeleye2

  • 1Department of Materials Science and Metallurgy, University of Cambridge, Cambridge, UK.

Journal of microscopy
|February 3, 2025
PubMed
概括

优化多显微镜技术的顺序,例如道电流AFM (TUNA),EBSD和CL,对于可靠的材料分析至关重要. 从最高到最低表面敏感度 (TUNA-EBSD-CL) 进行测量可以防止污染,并确保性能的准确相关性.