亚纳米等效氧化物厚度和值电压控制通过单层MoS2晶体管上的种子层实现
Jung-Soo Ko1, Sol Lee2,3, Robert K A Bennett1
1Department of Electrical Engineering, Stanford University, Stanford, California 94305, United States.
Nano letters
|February 4, 2025
概括
研究人员开发了一种简单的方法,可以在2D半导体上制造超薄门绝缘体,例如二硫化 (MoS). 这一突破使得低功率晶体管的制造成为可能,其性能得到改善,能耗降低.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体物理 半导体物理
背景情况:
- 二维 (2D) 半导体为先进的电子产品提供了潜力,但需要超薄门绝缘体.
- 这些绝缘体在二维材料上的原子层沉积 (ALD) 由于表面敏感性而具有挑战性.
- 实现高质量的接口对于低功耗晶体管的性能至关重要.
研究的目的:
- 开发一种有效的表面准备方法,用于单层MoS2上的门绝缘体的ALD.
- 为了在MoS2上实现HfO2门介电物的sub-1nm等效氧化物厚度 (EOT).
- 为了使使用二维半导体制造高性能,低功耗晶体管.
主要方法:
- 研究了六种种子层候选物 (Si,Ge,Hf,La,Gd,Al) 用于表面制备.
- 利用原子层沉积 (ALD) 在单层MoS2上沉积HfO2门介电.
- 制造和特征单层MoS2晶体管与HfO2顶门介电器.
主要成果:
- 发现Si和Ge的种子层对MoS2无害.
- 与Ge相比,Si种子层产生了优越的低歇斯底里接口.
- 实现了低于1nm的EOT (≈0.9nm) 低泄漏率 (<0.6μA/cm2) 和≤80mV/dec的下值摆动.
- 通过界面层厚度对值电压的证明控制,使得晶体管能够正常关闭.
结论:
- 一个简单的Si种子层在单层MoS2上促进HfO2的高质量ALD.
- 这种方法可以制造出具有出色电气特性的先进的低功率晶体管.
- 这种方法与标准的纳米制造设施兼容,促进了更广泛的采用.
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