竞争的铁电极化和缺陷迁移诱导了β'-In2Se3中的电阻切换
Yinfeng Long1, Saiyu Bu2, Han Chen1
1School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.
Nano letters
|February 10, 2025
概括
这项研究揭示了缺陷,特别是空缺,如何驱动分层化 (In2Se3) 设备中的电阻切换,而不仅仅是铁电效应. 了解这种缺陷迁移是控制设备性能的关键.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 固态化学 固态化学
背景情况:
- 层状β'-印化物 (In2Se3) 具有多铁性质,吸引了研究兴趣.
- 之前的研究主要集中在材料水平的特性上,对设备水平的电行为进行了有限的调查.
研究的目的:
- 系统地研究β'-In2Se3设备的内平面电阻切换行为.
- 阐明缺陷迁移在这些设备的电气特性中的作用.
主要方法:
- 时间依赖的当前演变测量.
- 在现场电力显微镜 (EFM).
- 密度函数理论 (DFT) 的计算.
主要成果:
- 在β'-In2Se3中的电阻切换受铁电极化逆转和缺陷迁移的影响.
- 电场诱导的空位迁移被确定为电阻切换的关键因素.
- 建立了一个全面的物理模型,考虑免费载体,绑定电荷和移动缺陷.
结论:
- 该研究提供了对2D范德瓦尔斯 (vdW) 铁电器件中复杂的电阻开关机制的关键见解.
- 了解缺陷迁移对于操纵和优化基于In2Se3的电子设备的性能至关重要.
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