高电流和载波密度在2D MoS2/AlScN 场效应晶体管中通过铁电门和欧姆接触
Seunguk Song1,2,3, Kwan-Ho Kim1, Rachael Keneipp4
1Department of Electrical and Systems Engineering, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.
ACS nano
|February 26, 2025
概括
使用接触的接触工程铁电场效应晶体管 (FeFET) 显著提高了性能. 这些设备显示了增强的电流和开关比率,使2D半导体通道中的高载体密度传输成为可能.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 纳米技术 纳米技术
背景情况:
- 具有2D半导体通道的铁电场效应晶体管 (FeFET) 是低功耗,非挥发性内存和内存计算的关键.
- 性能限制包括电荷不平衡和低维半导体中的高接触电阻.
研究的目的:
- 通过接触工程来提高二维半导体FeFET的性能.
- 调查特定接触材料对设备特性的影响.
主要方法:
- 使用2D MoS2通道和AlScN铁电门介电器制造FeFET.
- 使用印 (In) 与 (Ti) 接触电极的设备性能比较.
主要成果:
- 用In接口取代Ti,导致开启状态电流 (在1V下≤120μA/μm) 和开启-关闭比率 (≤2 × 107) 增加了5倍.
- 由于AlScN的极化,在MoS2通道中实现了高载体度 (>10^14cm^-2).
- 在冷却温度下的单层MoS2中观察到金属到绝缘体的电子相位过渡,从而实现高场效应的移动性 (>100 cm^2 V^-1 s^-1).
结论:
- 使用印的接触工程显著提高了FeFET的性能.
- 开发的FeFETs为2D通道中的高载体密度传输提供了一个平台,扩大了它们对先进计算应用的潜力.
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