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Updated: May 25, 2025

Picometer-Precision Atomic Position Tracking through Electron Microscopy
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高度定向的大粒2D Cs3Bi2X9多晶片通过同源格子同质皮质学 摄影检测的战略

Hantao Wang1, Yu Zou1,2, Liang Li3

  • 1State Key Laboratory for Artificial Microstructures and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, P. R. China.

Nano letters
|February 26, 2025
PubMed
概括

研究人员开发了一种新方法来创建高质量的,大粒度的二维 (2D) bismuth 化物 (Cs3Bi2X9) 膜. 这种技术克服了多晶固体的局限性,使光电子设备的性能与单晶相提并论.

关键词:
2D Cs3Bi2X9多晶片的使用具有高度定向的大粒度.同质的格子同质性质的同质性质的同质性质 (homoepitaxy).摄影检测 摄影检测 摄影检测

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