在Ga2O3铁电接口中的偏差依赖带对齐通过操作HAXPES
Anthony Boucly1,2, Tyson C Back3, Thaddeus J Asel3
1SPEC, CEA, CNRS, , Université Paris-Saclay, CEA Saclay, Gif-sur-Yvette, 91191, France. anthony.boucly@sorbonne-universite.fr.
Scientific reports
|March 7, 2025
概括
这项研究研究了氧化物 (HZO) 对氧化物接口的作用. 电荷捕获防止铁电极化,导致带偏差诱导的带偏斜在带对齐.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 纳米技术纳米技术
背景情况:
- 氧化 (Ga2O3) 是一种宽带间隙半导体,具有电力电子的潜力.
- 德 (Ge) 被探索为n型Ga2O3的补充剂,这是由于其浅度的供体水平和有利的生长.
- 氧化 (HZO) 是一种铁电材料,在内存和逻辑设备中具有潜在的应用.
研究的目的:
- 为了研究HfZrO4 (HZO) 和Ge-doped Ga2O3.3的接口上的带对齐.
- 为了了解Ge兴奋剂对Ga2O3特性对HZO集成的影响.
- 探索利用HZO中的铁电极化在设备应用中的可行性.
主要方法:
- 硬X射线光电子光谱 (HAXPES) 具有现场偏差应用以测量带对齐.
- 高分辨率传输电子显微镜 (HRTEM) 用于结构特征.
- 电气特性,以评估电荷注入和捕获.
主要成果:
- 结构分析证实了HZO.的极极形阶段.
- 电气表征揭示了在HZO/Ga2O3接口的电荷注入和捕获.
- 这些界面问题阻止了HZO中铁电极化的稳定.
- 带的对齐主要是由偏差诱导的带倾斜,这是由于漏水的HZO层造成的.
结论:
- 由于接口充电效应,HZO与Ge-doped Ga2O3的整合面临着挑战.
- 在这些条件下,HZO中的铁电极化不会稳定.
- 波段对齐受到应用偏差的显著影响,导致波段倾斜.
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