基于铁电氧化物的异构结构中的接口现象和新兴功能
Yifei Hao1, Tianlin Li1, Xia Hong1
1Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, NE, 68588-0299, USA. xia.hong@unl.edu.
概括
铁电矿氧化物通过接口合使新的电子和纳米光子学成为可能. 这篇评论探讨了异构结构,新兴现象以及内存和光学设备中的应用.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 固态化学 固态化学
背景情况:
- 铁电矿氧化物提供非挥发性,纳米级的极化控制.
- 它们的特性可以通过异构结构中的接口合来调整.
- 薄膜和膜表现出对边界条件敏感的不稳定性.
研究的目的:
- 审查基于铁电氧化物的异构结构,重点关注表轴和范德瓦尔斯接口.
- 涵盖这些系统中的合成,表征和新出现的现象.
- 概述铁电氧化物异构结构的应用和未来研究方向.
主要方法:
- 对铁电氧化物薄膜,膜和异构结构的合成技术的审查.
- 材料特性和界面合效应的表征.
- 分析新出现的现象和设备应用.
主要成果:
- 探索与二维范德瓦尔斯材料接口的表轴性矿氧化物异构结构和铁电氧化物.
- 讨论诸如偏振控制的金属绝缘器过渡,负电容和可编程的第二和弦生成等现象.
- 突出非易失性内存,逻辑和可重新配置的光学设备中的应用.
结论:
- 铁电氧化物异构结构对节能电子和纳米光子学具有前景.
- 接口工程解锁了各种新兴现象和设备功能.
- 未来的研究方向包括远程表观,氧化物摩埃尔工程和拓性质实现.
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