在MoS2领域效应晶体管中通过反向喷射诱导的结构修改来优化接触电阻
Yuan Fa1,2, Agata Piacentini1,2, Bart Macco3
1AMO GmbH, Advanced Microelectronic Center Aachen, Otto-Blumenthal-Str. 25, 52074 Aachen, Germany.
ACS applied materials & interfaces
|March 11, 2025
概括
反向喷射通过形成导电性1T-MoS2.2,显著降低了二硫化场效应晶体管 (MoS2-FET) 的接触电阻. 这提高了晶体管的性能,为先进的二维材料电子铺平了道路.
科学领域:
- 材料科学 材料科学 材料科学
- 固态物理 固态物理
- 纳米技术 纳米技术
背景情况:
- 基于二维材料 (2DM) 的场效应晶体管 (FET) 对扩展摩尔定律充满希望,因为它们具有超短通道的潜力.
- 二硫化物 (MoS2) -FETs受到金属-MoS2接口上Schottky屏障引起的高接触电阻 (Rc) 的影响,限制了ON状态电流.
研究的目的:
- 研究MoS2的修改以降低MoS2-FETs中的接触电阻.
- 通过反向喷雾,探索金属-MoS2接口的导电性1T-MoS2的形成.
主要方法:
- 使用反向喷雾技术在金属-MoS2接口上修改MoS2表面.
- 在反向喷雾处理之前和之后制造和特征MoS2-FET.
主要成果:
- 与未经处理的MoS2-FET相比,优化的反向喷雾条件将Rc降低了50%以上.
- 处理导致在接触界面形成导电性1T-MoS2.
- 在经过处理的MoS2-FET中观察到更好的电气特性,包括更高的ON状态电流.
结论:
- 反向喷雾是一种有效的方法,可以减轻Schottky屏障并降低MoS2-FET的接触电阻.
- 这种标准的半导体工艺为增强基于2DM的微电子设备和电路的性能提供了可行的途径.
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