SLowFlowS: 一个新的半导体工艺气体流量标准.
J G Pope1, K A Gillis1, A N Johnson1
1Fluid Metrology Group, Sensor Science Division, National Institute of Standards and Technology, Gaithersburg, MD 20899.
概括
一个新的半导体低流量标准 (SLowFlowS) 由NIST开发,以准确测量工艺气体. 该标准通过实现精确的气流控制,提高设备产量和吞吐量来改善半导体制造.
科学领域:
- 计量学 计量学 计量学
- 半导体制造业 半导体制造业
- 流体动力学 流体动力学
背景情况:
- 准确测量半导体工艺气体对于芯片生产效率和产量至关重要.
- 由于没有国家流量标准,因此需要对气体校准进行近似测量 (计量因子).
- 目前使用对工艺气体进行气校准的方法带来了不准确性.
研究的目的:
- 为半导体工艺气体制定新的国家流量标准.
- 为了能够准确地建模气体物种对商业流量计和控制器的影响.
- 为了让用校准的仪表能够准确测量危险的工艺气体.
主要方法:
- 开发一种增速流量标准 (SLowFlowS),具有独特的采集几何形状 (长而细的管道).
- 实施空气浴,以提高热稳定性和准确的温度预测.
- 热力学模型的实验验证,流量标准测试和不确定性分析.
主要成果:
- SLowFlowS标准实现了扩展的不确定性 (95%的信心) 在0.056%和0.098%之间.
- 该标准涵盖了从0.01厘米3/分钟到1000厘米3/分钟的广泛流量范围.
- 在填充过程中,确切的温度预测和热传递得到了确认.
结论:
- 开发的SLowFlowS为半导体工艺气体提供了可靠的国家流量标准.
- 这一标准将大大提高半导体制造中的气流测量的准确性.
- 它可以实现精确的校准和建模,从而提高半导体设备的产量和吞吐量.
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