堆叠的纳米板门-全方位形态相位边界场效应晶体管
Sihyun Kim1, Hyun-Min Kim2, Ki-Ryun Kwon2
1Department of Electronic Engineering, Sogang University, Seoul, 04107, Republic of Korea.
Advanced science (Weinheim, Baden-Wurttemberg, Germany)
|March 17, 2025
概括
铁电-抗铁电混合相的氧化 (HZO) 提高了新型形态相边界场效应晶体管 (MPB-FET) 的性能. 这些设备显示出改善的电流,电压可扩展性和耐用性,用于低功耗电子产品.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体设备物理 半导体设备物理
- 纳米技术 纳米技术
背景情况:
- 铁电 (FE) 和反铁电 (AFE) 材料具有独特的电特性.
- 氧化 (HZO) 是先进的门介电材料的一个有前途的材料.
- 铁电中的形态相边界 (MPB) 现象使得设备特性得到增强.
研究的目的:
- 研究使用混合相HZO的场效应晶体管 (FET) 的性能改进.
- 探索MPB-FET在高速和低功耗应用中的潜力.
- 制造和表征新的双堆叠纳米板 (NS) 门全方位 (GAA) MPB-FET.
主要方法:
- 使用FE-AFE混合相HZO的材料设计.
- 制造两个堆叠的NS GAA MPB-FET.
- 电气特性包括电容,短暂电流和偏差温度不稳定性 (BTI) 测量.
主要成果:
- MPB-FETs表现出的下值波动 (SS) 和增强的非歇斯底里电流 (Ion).
- 接近值电压 (VTH) 的电容放大有助于Ion的提升.
- NS MPB-FET 显示出优越的短通道效应 (SCE) 免疫力,增强的电流可行性,以及在0.6V和120°C下超过10年的耐用性.
- 与控制MOSFET相比,实现了24.1%的Ion增益,82.5mV的操作电压可扩展性和30.7%的交流性能改进.
结论:
- 在MPB-FET中混合相HZO可以显著提高性能.
- NS MPB-FET 适用于低功耗,高性能 CMOS 技术.
- 材料设计策略允许有效的氧化物厚度缩放,而不会降低移动性.
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